Versatile Pulsed Laser Deposition and Thermal Evaporator System – PLD-T is a high vacuum thin film deposition system enables to deposit different materials by both Pulsed Laser Deposition and so Thermal Evaporation technique. It can deposit complex materials and crystalline structures onto substrates with very little setup involved.

Pulsed Laser Deposition technique leads to efficient, none-thermal ablation and preserves the stoichiometry of the target materials. By applying this method it could deposit materials such as nitrides, oxides, super lattices, polymers, and composites

Features

• Target manipulator with adjustable rotation speed
• 3 thermal sources and special feedthrough
• Quartz crystal monitoring system for real time thickness measurement (1 nm precision)
• Intuitive touch screen to control the coating process and rapid data input
• Plasma Cleaning
• User friendly software that can be updated via network
• Equipped with rotary sample holder
• Equipped with electronic shutter
• Equipped to motorized boat selection
• 500 °C substrate heater
• Vac coat Products are covered worldwide by both public and product Liability Insurance in case any property damage or personal injury happens caused by the Vac Coat systems.

Thermal Evaporation Sources (Boat/Basket/Coil)

The Pulsed Laser Deposition System can be fitted with three independent heat resistance thermal evaporation sources. The good design of the evaporation source holder causes no contamination transfer from sources materials to other materials. The length of source holders can be adjusted in the range of 5~10 cm which meets the costumer requirement.

Target Manipulator

PLD is equipped with a multi-target manipulator which includes three target with diameter of 2cm. Targets are in standard size and all of our target manipulators are motorized and includes target rotation.