MM DOUBLE-TANK CELL 2 X 15 ML - MAGNETIC MOUNT DOUBLE-TANK ETCH CELL
C-A-MM_D_TANK_ETCH-2x15, C-O-MM_D_TANK_ETCH-2x15
This is a horizontally mounted, double-tank cell typically used for anodization of Si-wafers with electrolyte backside contact. It consists of two polyether ether ketone (PEEK) gas-tight chambers each equipped with sapphire wafer serving as window for illumination allowing light-assisted porous Si formation. It well fits aqueous (FKM/EPDM O-Rings) and organic solvent (FFKM O-Rings) electrolyte requirements.
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THE LARGE ETCH CELL
C-A-L_ETCH-PEEK, C-A-L_ETCH-PTFE
One of the most common applications of an electrochemical etching cell is the preparation of a Nanocrystalline Porous Silicon Layer on a single crystal Si wafer.
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THE SMALL ETCH CELL
C-A-S_ETCH-PEEK, C-A-S_ETCH-PTFE
One of the most common applications of an electrochemical etching cell is the preparation of a Nanocrystalline Porous Silicon Layer on a single crystal Si wafer.
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THE STANDARD ETCH CELL
C-A-STD_ETCH-PEEK, C-A-STD_ETCH-PTFE
One of the most common applications of an electrochemical etching cell is the preparation of a Nanocrystalline Porous Silicon Layer on a single crystal Si wafer.
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